dc.contributor.author |
Cao, Peng |
en |
dc.contributor.author |
Zhang, DL |
en |
dc.date.accessioned |
2011-12-18T23:11:34Z |
en |
dc.date.issued |
2006 |
en |
dc.identifier.citation |
International Journal of Modern Physics B 20(25-27):3830-3835 2006 |
en |
dc.identifier.issn |
0217-9792 |
en |
dc.identifier.uri |
http://hdl.handle.net/2292/10163 |
en |
dc.description.abstract |
The grain growth kinetics of nanocrystalline copper thin film samples was investigated. The grain size of nanocrystalline copper samples was determined from the broadening of X-ray spectra. It was found that the grain size increased linearly with isothermal annealing time within the first 10 minutes, beyond which power-law growth kinetics is applied. The activation energy for grain growth was determined by constructing an Arrhenius plot, which shows an activation energy of about 21 – 30 kJ/mol. The low activation energy is attributed to the second phase particle drag and the porosity drag, which act as the pinning force for grain growth in nanocrystalline copper. |
en |
dc.publisher |
world scientific publishing |
en |
dc.relation.ispartofseries |
International Journal of Modern Physics B |
en |
dc.rights |
Items in ResearchSpace are protected by copyright, with all rights reserved, unless otherwise indicated. Previously published items are made available in accordance with the copyright policy of the publisher. Details obtained from http://www.sherpa.ac.uk/romeo/issn/0217-9792/ |
en |
dc.rights.uri |
https://researchspace.auckland.ac.nz/docs/uoa-docs/rights.htm |
en |
dc.title |
Thermal stability of nanocrystalline copper films |
en |
dc.type |
Journal Article |
en |
dc.identifier.doi |
10.1142/S0217979206040441 |
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pubs.issue |
25-27 |
en |
pubs.begin-page |
3830 |
en |
pubs.volume |
20 |
en |
dc.rights.holder |
Copyright: world scientific publishing |
en |
pubs.end-page |
3835 |
en |
dc.rights.accessrights |
http://purl.org/eprint/accessRights/RestrictedAccess |
en |
pubs.subtype |
Article |
en |
pubs.elements-id |
93045 |
en |
pubs.org-id |
Engineering |
en |
pubs.org-id |
Chemical and Materials Eng |
en |
pubs.record-created-at-source-date |
2010-09-01 |
en |