Influence of oxygen plasma treatment on poly(ether sulphone) films

Abstract

Poly(ether sulphone) (PES) is one of the most widely used materials in the micro-electronics industry and a good candidate for the substrates of flexible optoelectronic devices. In this work, the influences of oxygen plasma treatment on the surface chemical composition, surface morphology and optical transparency of PES films were investigated by means of X-ray photoelectron spectroscopy (XPS), field emission scanning electron microscopy (FESEM), atomic force microscopy (AFM) and UV-visible spectrop h o tome try. The possible relations between the optical transparency of the substrate and the surface roughness and chemical composition were also studied. The oxygen plasma treatment seriously changed the surface chemical composition and made the surface more rough. Considerable amounts of sulphate species were found on the plasma-treated surface and the surface roughness values (R-a) increased monotonically with the increase of the treatment time. The PES films treated by 5 min, 15 min, 30 min and 45 min oxygen plasma demonstrated transmission of approximately 98, 94, 68 and 46%, respectively, in the wavelength range of 400-780 nm. The oxygen plasma induced decline of optical transparency of PES films might be attributed to both the increase of surface roughness and the changes of chemical composition of the film surface.